[Dsg-hallb_magnets] Fwd: Hall B - LCW Make Up Flow 'Spikes' Investigation

[Ruben Fair]

FYI 


From: "Carroll Jones" <jonesc at jlab.org> 
To: "Ruben Fair" <rfair at jlab.org>, "Steven Lassiter" <lassiter at jlab.org>, "Michael Fowler" <fowler at jlab.org>, "Jessie Butler" <jbutler at jlab.org>, "Robin Wines" <wines at jlab.org> 
Cc: "Nicholas Sandoval" <sandoval at jlab.org>, "Probir Ghoshal" <ghoshal at jlab.org>, "Brian Eng" <beng at jlab.org>, "Denny Insley" <dinsley at jlab.org>, "Mike Sprouse" <msprouse at jlab.org>, "Bob Sperlazza" <sperlazz at jlab.org>, "Matthew Winkel" <winkel at jlab.org>, "Ronald Bartek" <bartek at jlab.org>, "Celia Whitlatch" <whitlatc at jlab.org>, "Steve Suhring" <suhring at jlab.org> 
Sent: Monday, November 12, 2018 7:21:35 PM 
Subject: Re: Hall B - LCW Make Up Flow 'Spikes' Investigation 



The makeup pump activates whenever the Hall LCW System Expansion Tank (ET-S-1)water level reaches the low valve on level or when the Beam Dump Makeup Water System Expansion Tank (ET-S-3)water level reaches the low valve on level. Therefore, makeup water flow could occur due to replace water lost due to leaks or maintenance activities in Hall A, Hall B, Hall C, Building 91, Building 92, or Building 95. Honeywell trend information indicates the makeup pump activated 1/1/18, 1/24/18, 2/19/18, 5/11/18, 5/23/18, 5/29/18, 6/6/18, 6/11/18, 6/19/18, 7/7/18, 7/17/18, 7/31/18, 8/19/18, 8/27/18, 9/13/18, 9/29/18, 10/10/18, and 11/2/18. The makeup pump actually automatically activates when the full open feedback position sensor on either the Hall LCW System makeup valve or Beam Dump Makeup System makeup valve indicates the valve is fully open. 




A piping schematic is attached as requested. 




Please note that all the site LCW systems periodically makeup. The most significant change that I see from an overall Hall LCW System viewpoint is the system delivered differential pressure has slowly reduced from its setting of 195 PSIG to approximately 175 PSIG. Flow demand to the various halls have slowly increased. We could try switching to the backup pump to see if pump performance may have deteriorated due to impeller wear or some other pump related issue, but it appears the system pressure drop is due to increased system demand. The pump switchover could occur the next scheduled maintenance day. 





For additional information or clarification, please contact me at 757-876-1778. 




Sincerely, 




Carroll W. Jones 

From: Ruben Fair <rfair at jlab.org> 
Sent: Monday, November 12, 2018 2:45:58 PM 
To: Steven Lassiter; Mike Fowler; Jessie Butler; Robin Wines 
Cc: Carroll Jones; Nicholas Sandoval; Probir Ghoshal; Brian Eng; Denny Insley 
Subject: Hall B - LCW Make Up Flow 'Spikes' Investigation 
Hi all, 

As you may know, we have been suffering for quite sometime with the Hall B Solenoid magnet inadvertently fast dumping. 

Investigations thus far point strongly to a correlation between the LCW Make Up Flow 'spiking' and somehow reducing flow to the solenoid magnet power supply within Hall B. The PV that we have been looking at is 'lcw:92_Flow_Makeup'. 

We believe this PV monitors the LCW makeup flow to all three halls (A, B and C). 

Could I kindly ask you to review the date and timestamps below and let me know if there was anything going on in your halls at those times which could explain why the makeup flow suddenly increases. Times are approximate and indicate when the PV shows a sudden increase. 

11.02.18 03:48 
10.10.18 00:20 
09.29.18 08:05 
08.30.18 13:30 
08.27.18 08:50 
04.08.18 01:15 
02.19.18 15:30 
01.23.18 23:45 
12.12.17 21:45 

Carroll, 

Can you please confirm that this PV does indeed refer to all 3 halls? 

Also, what tells the pump to boost the makeup flow? Is there another electronic signal or PV elsewhere that triggers the pump? 

Do you have a LCW pipework diagram that we can take a look at? 

Many thanks 

Ruben 

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