[TFSRF2020] Registration & abstract submission now open for the 9th International Workshop on "Thin films applied to Superconducting RF: Pushing the limits of RF Superconductivity" - Virtual Edition

[Anne-Marie Valente]

Dear colleagues,


First, on behalf of the TFSRF organizing committee, I want to convey our best wishes for a healthy and fruitful New Year.

We are pleased to announce that the registration and abstract submission are now open for the

9th International Workshop on
"Thin films applied to Superconducting RF: Pushing the limits of RF Superconductivity"
Virtual edition

on March 15-18, 2021.



https://indico.jlab.org/e/TFSRF2021


The ninth workshop in this series, in the spirit of its previous in-person editions, aims at providing a forum for new initiatives in innovative thin films and related technology to advance future generations of superconducting RF accelerators. Present superconducting RF accelerator technology is based on predominately bulk niobium, for which the state of the art in performance is reaching the theoretical limit. Thin film technology offers the prospect of considerable savings in fabrication costs and opens the way with innovative technologies to the use of alternative superconducting materials with enhanced intrinsic properties such as critical temperature and critical field. Intensive and coordinated R&D effort is of decisive importance for the scientific Community.

The primary goal of the workshop is to support this initiative by providing an opportunity to bring together individuals and institutions working in this effort and infusing expertise of experts from related disciplines (superconductivity, plasma physics, material science, nanotechnology, RF engineering and industry. Reports on work from each participating group and extensive discussions on existing problems, new ideas and programs for the future will constitute the primary focus of the program.

For any kind of information, please do not hesitate to send an inquiry at TFSRF20_owner at jlab.org.

We are looking forward to your participation to the workshop.

Best regards,


On behalf of the international and local organizing committees,


Anne-Marie Valente-Feliciano


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